| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing method which has a function to replace a developing solution to restrain a dissolved resist from staying so as to promote development, and is capable of forming a three-dimensional resist pattern which is very accurate and uniformly developed when a thick resist layer is developed. SOLUTION: The developing method, in which a substrate where a photosensitive layer is provided and a developing solution feeding means which discharges a developing solution onto the photosensitive layer are rotated and moved at the same time, is characterized in that the developing solution feeding means is moved as it is discharging the developing solution, and the substrate is gradually reduced in rotational speed as development advances. COPYRIGHT: (C)2004,JPO&NCIPI |
