METHOD FOR DEPOSITING OXIDE FILM ON SURFACE OF BASE MATERIAL, AND APPARATUS USED FOR THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently depositing a dense oxide film of large film thickness on a surface of various kinds of base materials by an atmosphere-open type CVD method without heating the surface of the base materials at high temperature, and an apparatus to be used for the method. SOLUTION: An oxide film is deposited on a surface of a base material by colliding a mixture of evaporated raw material of the oxide film and carrier gas with heated oxide particles in advance in the atmosphere-open type CVD method, and blowing the raw material together with the oxide particles on the surface of the base material while promoting decomposition and oxidation of the raw material of the oxide film in advance by the heat of the oxide particles and oxygen in air. COPYRIGHT: (C)2004,JPO&NCIPI