| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment method of a shaping die and the shaping die which can produce and reproduce the shaping die without any wet etching process nor grinding process. SOLUTION: First, the relationship between the angle of incidence of an ion beam and an etching rate distribution in a shaping surface 12 is calculated beforehand each for tungsten carbide (WC) composing a substrate, chromium (Cr) composing an intermediate layer and chromium nitride (CrN) composing a surface layer, under the irradiation conditions identical to those applied at the time of surface treatment except the angle of incidence of the ion beam. From a membrane thickness ratio of Cr to CrN constituting the shaping surface 12, based on the relationship, and by using the shaping die controlling angleγas a parameter, the etching rate distribution from the surface top to the periphery end part of the shaping surface 12 is calculated. Based on these calculation, the optimum combinational conditions of the shaping die control angleγand treatment time for the etching depth required for the treatment are worked out to carry out the treatment. COPYRIGHT: (C)2004,JPO&NCIPI
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