APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE

摘要

PURPOSE: An apparatus for cleaning a semiconductor substrate is provided to eliminate the necessity of rotating the semiconductor substrate and avoid influencing the environments by cleaning and drying the semiconductor substrate while using megasonic and IPA(isopropyl alcohol). CONSTITUTION: An elevating lift(130) is installed inside a bath(110). A chuck(140) absorbs the semiconductor substrate(W), connected to the upper end of the elevating lift. A driving unit(120) drives the elevating lift during the cleaning and drying process to elevate the semiconductor substrate in the bath. A deionized water injecting nozzle(190) injects deionized water toward the elevated semiconductor substrate. A megasonic injecting nozzle(180) injects sonic wave toward the semiconductor substrate while the deionized water is being injected, so that the contaminants and particles absorbed to the inside of a film of the semiconductor substrate are eliminated. An IPA injection nozzle(170,175) injects IPA toward the elevated semiconductor substrate to eliminate the residual particles and deionized water on the semiconductor substrate. A gas injection nozzle injects drying gas toward the elevated semiconductor substrate.