发明名称 ANODES FOR ELECTROPLATING OPERATIONS, AND METHODS OF FORMING MATERIALS OVER SEMICONDUCTOR SUBSTRATES
摘要 <p>The invention includes anodes for electroplating, baths. The anodes have a purity of at least 99.9%, and comprise one or more of silver, gold, nickel, chromium, copper or various solder compositions. The anodes can, for example, comprise at least 99.995% copper/phosphorus alloy, by weight; or at least 99.995% nickel and sulfur, by weight. The invention also includes methods of electroplating, materials over semiconductor substrates.</p>
申请公布号 EP1444385(A1) 申请公布日期 2004.08.11
申请号 EP20010988180 申请日期 2001.11.16
申请人 HONEYWELL INTERNATIONAL, INC. 发明人 WHITE, TAMARA, L.;DEAN, NANCY, F.;WEISER, MARTIN, W.;PINTER, MICHAEL, R.
分类号 C25D1/04;C25D5/12;C25D7/12;C25D17/10;H01L21/288;H01L21/60;(IPC1-7):C25D7/12 主分类号 C25D1/04
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