发明名称 |
ANODES FOR ELECTROPLATING OPERATIONS, AND METHODS OF FORMING MATERIALS OVER SEMICONDUCTOR SUBSTRATES |
摘要 |
<p>The invention includes anodes for electroplating, baths. The anodes have a purity of at least 99.9%, and comprise one or more of silver, gold, nickel, chromium, copper or various solder compositions. The anodes can, for example, comprise at least 99.995% copper/phosphorus alloy, by weight; or at least 99.995% nickel and sulfur, by weight. The invention also includes methods of electroplating, materials over semiconductor substrates.</p> |
申请公布号 |
EP1444385(A1) |
申请公布日期 |
2004.08.11 |
申请号 |
EP20010988180 |
申请日期 |
2001.11.16 |
申请人 |
HONEYWELL INTERNATIONAL, INC. |
发明人 |
WHITE, TAMARA, L.;DEAN, NANCY, F.;WEISER, MARTIN, W.;PINTER, MICHAEL, R. |
分类号 |
C25D1/04;C25D5/12;C25D7/12;C25D17/10;H01L21/288;H01L21/60;(IPC1-7):C25D7/12 |
主分类号 |
C25D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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