发明名称 |
MONOLITHIC INK JET PRINT HEAD AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A monolithic ink jet print head and a method for manufacturing the same are provided to embody an ink jet print head on a single wafer through a series of a semiconductor processes by integrally forming a silicon substrate and a passage plate including photo-resist polymer. CONSTITUTION: A monolithic ink jet print head includes a silicon substrate having a manifold for supplying ink. A passage plate(130) has a photo resist polymer layer formed on the silicon substrate. The passage plate(130) includes an ink chamber(105), a nozzle(106), an ink channel(103), and a restrictor(104). The ink chamber(105) is filled with ink to be exhausted. The nozzle is arranged on an upper part of the ink chamber(105). The ink channel(103) is formed on the manifold. The restrictor(104) connects the ink channel(103) to the ink chamber(105). A heater(122) heats ink included in the ink chamber. The heater is arranged bottom of the ink chamber(105).
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申请公布号 |
KR20040071004(A) |
申请公布日期 |
2004.08.11 |
申请号 |
KR20030007440 |
申请日期 |
2003.02.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, JIN HYEON |
分类号 |
B41J2/235;(IPC1-7):B41J2/235 |
主分类号 |
B41J2/235 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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