METHOD FOR DESIGNING OVERLAY MEASUREMENT KEY OF SEMICONDUCTOR

摘要

PURPOSE: A method for designing an overlay measurement key of a semiconductor is provided to remove an overlay measurement error generated from an implant pattern step by improving a design of the overlay measurement key. CONSTITUTION: A blocking process is performed on a reference region of a first implant layer from a scribe line region. A reticle(50) of the first implant layer pattern is changed automatically. A photoresist blocking process is performed on the reference region of a second implant layer in a process for patterning the first implant layer. An implantation process is performed on the first implant layer. An overlay measurement sensor detects correctly a signal of an overlay measurement light source though an implanted poly surface without damage in a process for patterning the second implant layer.