CLEANING SYSTEM OF CMP EQUIPMENT BUILT IN MOVABLE INTERCEPTION DOOR

摘要

PURPOSE: A cleaning system of CMP equipment built in movable interception door is provided to prevent a floating phenomenon of particles and chemical fumes within the cleaning system by installing the partitions between the first and the second brush cleaners and between the second brush cleaner and a spin rinse dryer. CONSTITUTION: A cleaning system of CMP equipment includes the first and the second brush cleaners(110,120) and a spin rinse dryer(130) in order to clean a wafer. A plurality of mobile partitions(140,150) are installed vertically between the first and the second brush cleaners and between the second brush cleaner and the spin rinse dryer. The mobile partitions are moved to an upper side between the first and the second brush cleaners and an upper side between the second brush cleaner and the spin rinse dryer in a cleaning process, respectively.