SPIN RINSE DRY APPARATUS

摘要

PURPOSE: A spin rinse dry apparatus is provided to prevent a dispersing phenomenon of particles and remove a defect of a wafer due to the particles by using a shielding door for shielding an upper side of a main body. CONSTITUTION: A motor(120) is installed at a lower side of a main body(110). A motor cover(130) is installed in the inside of the main body in order to cover the motor. A wafer chuck(140) is installed at an upper side of the motor cover in order to rotate the wafer by using the driving power of the motor. A shielding door(150) is coupled to an upper end of the main body by using a hinge. An air filter(160) is installed in an installation hole of the shielding door. A cylinder(170) is fixed to one side of the main body.