发明名称 DIAMOND DISK OF CONDITIONER
摘要 PURPOSE: A diamond disk of a conditioner is provided to prevent generation of scratches on a surface of a wafer in a polishing process by removing diamond particles separated from a lower side of a diamond disk. CONSTITUTION: A diamond disk is adhered at a lower side of a conditioning end effector of a conditioner for conditioning a polishing pad of CMP equipment in order to condition the polishing pad. The diamond disk includes a disk(20) and a conditioning brush(30). A loading groove(21) is formed at a lower side of the disk. Diamond particles are adhered on the lower side except for the loading groove. The conditioning brush is formed with a brush body(31) installed on the loading groove and a brush(32) installed at a lower side of the brush body.
申请公布号 KR20040070587(A) 申请公布日期 2004.08.11
申请号 KR20030006760 申请日期 2003.02.04
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 HAN, GYEONG SU
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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