发明名称 |
DIAMOND DISK OF CONDITIONER |
摘要 |
PURPOSE: A diamond disk of a conditioner is provided to prevent generation of scratches on a surface of a wafer in a polishing process by removing diamond particles separated from a lower side of a diamond disk. CONSTITUTION: A diamond disk is adhered at a lower side of a conditioning end effector of a conditioner for conditioning a polishing pad of CMP equipment in order to condition the polishing pad. The diamond disk includes a disk(20) and a conditioning brush(30). A loading groove(21) is formed at a lower side of the disk. Diamond particles are adhered on the lower side except for the loading groove. The conditioning brush is formed with a brush body(31) installed on the loading groove and a brush(32) installed at a lower side of the brush body.
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申请公布号 |
KR20040070587(A) |
申请公布日期 |
2004.08.11 |
申请号 |
KR20030006760 |
申请日期 |
2003.02.04 |
申请人 |
ANAM SEMICONDUCTOR., LTD. |
发明人 |
HAN, GYEONG SU |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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