| 摘要 |
Disclosed is an exposure method wherein a first object (102) is illuminated with a slit-like light beam while the first object and a second object (108) are scanningly moved at a speed ratio corresponding to a projection magnification of a projection optical system (PL) such that a pattern of the first object is projected onto the second object through the projection optical system, wherein a mark (103) provided on the first object side is illuminated with exposure light, and wherein light from the mark is incident on the projection optical system whereby a revolutionally asymmetric aberration of the projection optical system due to an exposure is corrected or reduced. <IMAGE> |
