Transparent electroconductive film and process for producing same

摘要

There are provided:(1) a process for producing an InSbO4-containing transparent electroconductive film, which comprises the step of sputtering simultaneously:(i) a target (A) for sputtering, which comprises In, Sb and O, and whose atomic ratio of Sb/In is from 0.9 to 1.1, and(ii) a target (B) for sputtering, which comprises Sb,(2) a transparent eletroconductive film, which contains In, Sb and O, and whose atomic ratio of Sb/In is from 0.8 to 1.5, and(3) a target for sputtering, which contains In, Sb and O, and whose atomic ratio of Sb/In is from 1.2 to 2.0.