发明名称 |
Suspended gas distribution manifold for plasma chamber |
摘要 |
A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and contraction. In another aspect, the side wall provides thermal isolation between the gas distribution plate and other components of the chamber.
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申请公布号 |
US6772827(B2) |
申请公布日期 |
2004.08.10 |
申请号 |
US20010922219 |
申请日期 |
2001.08.03 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KELLER ERNST;SHANG QUANYUAN |
分类号 |
B01J19/08;C23C16/44;C23C16/455;C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H05H1/46;(IPC1-7):F24H9/06;F24H3/00 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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