In-situ purge system for article containers

摘要

An in-situ purge system for charging the interior of a semiconductor wafer pod with nitrogen gas after the pod is exposed to ambient moisture, air and particles in a clean room. A gas supply line extends into the pod interior from a gas source, and a gas exhaust line extends from the pod interior to remove moisture, particles and excess gas from the pod interior as the pod contains a wafer-filled cassette and rests typically on a SMIF arm before transfer to a processing tool or other destination in the facility. The removable bottom door of the pod and the bottom plate of the cassette are modified to receive the gas supply line and the gas exhaust line.