| 发明名称 |
Chemical vapor deposition method and related material |
| 摘要 |
A process for chemical vapor deposition includes depositing a film using a metal beta-diketonate complex and an alpha, beta-unsaturated alcohol. The metal beta-diketonate complex and the alpha, beta-unsaturated alcohol is contacted on the substrate at the same time, at different times or alternately.
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| 申请公布号 |
US6773750(B2) |
申请公布日期 |
2004.08.10 |
| 申请号 |
US20030422983 |
申请日期 |
2003.04.25 |
| 申请人 |
TRI CHEMICAL LABORATORY INC. |
发明人 |
FUNAKUBO HIROSHI;MURAKAMI YASUSHI;MACHIDA HIDEAKI |
| 分类号 |
H01L21/205;C23C16/18;C23C16/32;C23C16/34;C23C16/40;C23C16/44;C23C16/455;H01L21/316;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/205 |
| 代理机构 |
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