发明名称
摘要 A manufacturing method of a semiconductor device to perform processing, including pre-processing and post-processing, on a semiconductor substrate, a characteristic of the processed semiconductor substrate is inspected, whether the semiconductor substrate complies with a predetermined standard is judged, and a semiconductor substrate not complying with the standard is re-processed so that the semiconductor substrate complies with the standard.
申请公布号 KR100443683(B1) 申请公布日期 2004.08.09
申请号 KR20010084797 申请日期 2001.12.26
申请人 发明人
分类号 H01L21/66;H01L21/00;H01L21/02;H01L21/205;H01L21/302;H01L21/306;H01L21/3065;H01L21/316 主分类号 H01L21/66
代理机构 代理人
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