| 摘要 |
PURPOSE: An exposure apparatus of semiconductor manufacturing equipment is provided to improve the resolution of a wafer without the damage due to pattern variation, the decrease of light and the degradation of uniformity by using an aperture with an improved pattern. CONSTITUTION: An exposure apparatus of semiconductor manufacturing equipment includes a circular type first reflector and the second reflector, a fly's eye lens, an aperture(10), the third reflector, a condenser lens, a mask and a transparent lens. The aperture includes a circular type light transmission region(12) and a light shielding part(11) at the center of the light transmission region. A plurality of protrusions(20) are prolonged from the light shielding part to the light transmission region.
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