MASK FOR FABRICATING SEMICONDUCTOR

摘要

PURPOSE: A mask for fabricating a semiconductor is provided to reduce errors in a CD(Critical Dimension) measurement process by preventing storage of electrons around patterns. CONSTITUTION: A wafer(11) is formed with quartz or glass. A frame region(13) is formed by depositing chrome on an upper surface of the wafer. The frame region is connected to a ground part. A boundary region(15) is formed with the exposed surface of the wafer in the inside of the frame region. A pattern region(17) is formed in the inside of the boundary region. The boundary region is used for isolating the pattern region from the frame region. An auxiliary pattern is used for connecting the frame region to the pattern region.