发明名称 APPLY DEVICE OF SOLUTION AND APPLY METHOD THEREOF, CAPABLE OF APPLYING SOLUTION IN ALMOST UNIFORM DISTRIBUTIVE STATE
摘要 PURPOSE: An apply device of a solution and an apply method are provided to remember plural nozzle positions installed on heads as coordinates data, and to control a discharge of a solution from each nozzle according to applied patterns of the solution and the coordinates data, thereby applying the solution in almost uniform distributive state. CONSTITUTION: Drivers(20) formed on each head(9) are controlled by a control device(21). X and Y coordinates of each nozzle formed on the heads(9) are remembered in the control device(21). The X and Y coordinates of the nozzles are set according to mounting positions of the heads(9) after mounting each head(9) on a mounting member. The control device(21) controls a driving of the drivers(20) according to applied patterns of a solution applied to a substrate, and operates piezoelectric elements corresponding to the nozzles for discharging the solution.
申请公布号 KR20040070022(A) 申请公布日期 2004.08.06
申请号 KR20040005339 申请日期 2004.01.28
申请人 SHIBAURA MECHATRONICS CORP. 发明人 MATSUSHIMA DAISUKE;TOYOSHIMA NORIO;KAJIWARA SHINJI
分类号 B41J2/01;B05C5/00;B05C11/10;G02F1/13;G02F1/1337;(IPC1-7):G02F1/13 主分类号 B41J2/01
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