OPTICAL SYSTEM AND METHOD FOR ANALYZING WAFER SURFACE

摘要

PURPOSE: An optical system and method for analyzing a wafer surface are provided to improve the sensitivity and resolution by irradiating uniformly light source to a wafer using a complete reflection sphere. CONSTITUTION: A light source part(3) irradiates light source to a wafer(1). A complete reflection sphere(6) is located between the light source part and the wafer to condense the light source to a single point. Laser beam is used as the light source. A condenser lens is capable of being located between the complete reflection sphere and the wafer to remove diffraction effect.