PHOTORESIST SUPPLY NOZZLE OF SEMICONDUCTOR COATING EQUIPMENT

摘要

PURPOSE: A photoresist supply nozzle of semiconductor coating equipment is provided to improve the uniformity of pattern CD(Critical Dimension) by unifying the contact time between photoresist and the entire surface of a wafer using a disk-type structure as the nozzle. CONSTITUTION: A disk-type photoresist supply nozzle(50) is over a wafer corresponding to the entire surface of the wafer. A plurality of spraying holes(52) spaced apart from each other are formed on the entire lower surface of the nozzle, so that photoresist is uniformly supplied to the wafer.