APPARATUS FOR INSPECTING PHOTORESIST LAYER OF SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus for inspecting a photoresist layer of a semiconductor wafer is provided to improve the productivity of semiconductor devices by detecting coating-failure of the photoresist layer using a laser beam emitting and receiving part while centering the wafer. CONSTITUTION: A vacuum chuck(15) for loading stably a semiconductor wafer(W) is installed on a check block(1). A sensor(5) for detecting the center of the semiconductor wafer is connected with the check block through a support part(3). A light emitting part(9) for irradiating laser beam to the semiconductor wafer is installed at one side of the vacuum chuck. A light receiving part(11) for receiving the laser beam reflecting from the wafer is installed at the other side of the vacuum chuck. A controller(13) for monitoring surface state of the wafer is connected with the light emitting and receiving part.