| 摘要 |
PURPOSE: A field emission device and a fabricating method thereof are provided to improve surface roughness of a lower material of an electron emission part by forming a narrow and thick scan electrode on the electron emission part of a data electrode. CONSTITUTION: A field emission device includes a substrate, a data electrode, an anode oxide layer, a tunnel oxide layer, a double oxide layer, and a scan electrode. The data electrode is formed on an upper surface of the substrate. The anode oxide layer is formed on the remaining part of the data electrode except for a predetermined region of the data electrode. The tunnel oxide layer is formed on the predetermined region of the data electrode. The double oxide layer is formed on the upper surface of the substrate except for the tunnel oxide. The scan electrode having an opening part is formed on the upper surface of the substrate. The thickness of the data electrode is controlled to obtain the surface roughness within the predetermined range. The thickness of the scan electrode is controlled to prevent the voltage drop due to the scan current.
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