发明名称 ION SOURCE OF ION INJECTION APPARATUS
摘要 PURPOSE: An ion source of an ion injection apparatus is provided to protect an end cap of an arc chamber in case of creating a beam and to create efficiently a plasma in the arc chamber. CONSTITUTION: An ion source(110) of an ion injection apparatus comprises an arc chamber(112) into which a gas is injected for an ion injection process, a filament(114) for emitting a thermion to ionize the gas inside the arc chamber, and a reflector(116) for repelling the thermion in opposition to the filament and located at a center of the arc chamber and rocking to achieve efficiently a creation of a plasma in the arc chamber. The reflector is a square type and has a round corner.
申请公布号 KR20040069447(A) 申请公布日期 2004.08.06
申请号 KR20030005842 申请日期 2003.01.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SANG GUK
分类号 H01J37/36;(IPC1-7):H01J37/36 主分类号 H01J37/36
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