发明名称 METHOD FOR MEASURING TOTAL ORGANIC CARBON CONTENT OF WAFER FOR SEMICONDUCTOR FABRICATION BY USING TOC METER
摘要 PURPOSE: A method for measuring a total organic carbon content of a wafer is provided to manage effectively the contamination of the wafer by using nitric acid to measure organic material content of the wafer as the total organic carbon content. CONSTITUTION: A method for measuring a total organic carbon content of a wafer includes a dissolution process and a measurement process. The dissolution process is performed to dissolve organic materials from a wafer by depositing the wafer onto nitric acid. The measurement process is performed to measure the total organic carbon content by introducing the nitric acid including the dissolved organic materials into a TOC meter.
申请公布号 KR100444645(B1) 申请公布日期 2004.08.06
申请号 KR19970065035 申请日期 1997.12.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MUN, SANG SIK;PARK, DONG JIN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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