发明名称 |
APPARATUS FOR REMOVING PARTICLES FROM SURFACE OF DISC IN CMP EQUIPMENT |
摘要 |
PURPOSE: An apparatus for removing particles from a surface of a disc in CMP equipment is provided to reduce an error rate and scratches and lengthen the lifetime by preventing the damage of the disc. CONSTITUTION: A plurality of injection nozzles(40,41) are installed in a predetermined interval at one side of a clean cup(14) in order to inject deionized water to a lateral part of a disc. A conditioning disc(16) is restored to the clean cup. An injection nozzle(42) is installed at bottom of the clean cup in order to inject the deionized water to a bottom of the disc. A disc detection sensor(50) is installed at one side of the clean cup in order to detect a restoring state of the disc.
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申请公布号 |
KR20040069846(A) |
申请公布日期 |
2004.08.06 |
申请号 |
KR20030006399 |
申请日期 |
2003.01.30 |
申请人 |
ANAM SEMICONDUCTOR., LTD. |
发明人 |
JUNG, JE DEOK;LEE, JIN GYU |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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主权项 |
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地址 |
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