发明名称 |
SPIN CLEANER AND METHOD FOR CLEANING SUBSTRATE USING THE SAME |
摘要 |
PURPOSE: A spin cleaner and a method for cleaning a substrate using the same are provided to remove particles and reduce damage by performing a non-contact method using a fluid film formed between a substrate and a cleaning unit. CONSTITUTION: A path is formed at a cleaning unit(21) in order to inject a cleaning solution onto a substrate. The cleaning unit forms a fluid film on the substrate in order to clean the substrate. A rotation motor(24) is used for rotating the cleaning unit. A cleaning arm is connected to the cleaning unit. The cleaning arm is moved around the substrate by using a cleaning motor. A cleaning tube is connected to the injection path in order to supply the cleaning solution. An elevation cylinder is used for elevating the cleaning arm to align the cleaning unit on the substrate.
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申请公布号 |
KR20040069745(A) |
申请公布日期 |
2004.08.06 |
申请号 |
KR20030006281 |
申请日期 |
2003.01.30 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
KIM, BYEONG JIN;KIM, GWANG IL;KIM, YEONG GAK;NAM, MYEONG U |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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