METHOD FOR FABRICATING ANODE OF ORGANIC SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE THEREBY

摘要

PURPOSE: A method for fabricating an anode of an organic semiconductor device and a semiconductor device thereby are provided to improve an electrical characteristic by lowering a hole injection barrier. CONSTITUTION: A method for fabricating an anode of an organic semiconductor device includes a process for forming a first TCO(Transparent Conducting Oxide) layer and a process for forming a second TCO layer. The process for forming the first TCO layer is performed to form the first TCO layer by controlling the optimum amount of oxygen(S1). The process for forming the second TCO layer is performed to form the second TCO layer by controlling the excessive amount of oxygen(S2).