发明名称 EXCIMER IRRADIATION DEVICE AND ITS INITIAL ADJUSTMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide an excimer irradiation device which has a silica glass as a light transmitting member and performs irradiation processing while having a high ultraviolet-ray transmissivity. SOLUTION: The excimer irradiation device for radiating vacuum ultraviolet light having a wavelength of 172 nm is provided. In the method having the light transmitting member made of the silica glass having an OH radical concentration of 150 to 400 ppm, the vacuum ultraviolet light is transmitted through the light transmitting member. During a period of time after the light transmissivity of the light transmitting member for a wavelength of 172 nm decreases until the transmissivity again increases, the device is operated at least in its running-in mode. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004221490(A) 申请公布日期 2004.08.05
申请号 JP20030009993 申请日期 2003.01.17
申请人 USHIO INC 发明人 TAKEMOTO FUMITOSHI;FUKUDA SATORU;FURUE SATORU
分类号 G21K5/00;B01J19/12;H01J65/00;H01L21/26;(IPC1-7):H01L21/26 主分类号 G21K5/00
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