发明名称 Production of structured ceramic layers on surfaces of relief arranged vertically to substrate surface comprises preparing semiconductor substrate with relief on its surface, filling the relief with lacquer and further processing
摘要 <p>Production of structured ceramic layers on surfaces of a relief arranged vertically to a substrate surface comprises preparing a semiconductor substrate (1) with a relief on its surface, filling the relief with a lacquer (4) up to a determined depth, depositing a ceramic layer (6) made from a ceramic material using a low temperature ALD process, anisotropically etching the ceramic layer so that the ceramic layer remains on the surfaces which are vertical to the substrate surface, and removing the lacquer layer.</p>
申请公布号 DE10303413(B3) 申请公布日期 2004.08.05
申请号 DE2003103413 申请日期 2003.01.29
申请人 INFINEON TECHNOLOGIES AG 发明人 SEIDL, HARALD;GUTSCHE, MARTIN;HECHT, THOMAS
分类号 C23C16/00;H01L21/02;H01L21/31;H01L21/311;H01L21/314;H01L21/70;H01L21/8234;H01L21/8242;(IPC1-7):H01L21/824 主分类号 C23C16/00
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