发明名称 METHOD FOR FORMING MULTILAYER FILM, AND FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a film-forming apparatus for forming such a multilayer film as to make the product get a passing grade. SOLUTION: This apparatus has a crucible 40A for accommodating a vaporizing material, an electron gun 42A, a deflector for leading an electron beam from an electron gun onto the vaporizing material in the crucible, a scanner for scanning the vaporizing material with the electron beam, and a rotation substrate 33 for making the particles vaporized from the crucible form a film thereon, all arranged in an air-exhausted chamber 31. In addition, the apparatus has X and Y stages 44A and 43A for moving the crucible 40A along a face parallel to the surface to be film-formed of the substrate 33, and X and Y stages 37 and 36 for moving the substrate 33 along the face parallel to the surface to be film-formed of the substrate. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004217962(A) 申请公布日期 2004.08.05
申请号 JP20030004086 申请日期 2003.01.10
申请人 JEOL LTD;JEOL SYSTEM TECHNOLOGY CO LTD 发明人 MINEGISHI HIDEO;MUROTA MASAO;YAMAGATA MASAYASU
分类号 G02B5/28;C23C14/24;(IPC1-7):C23C14/24 主分类号 G02B5/28
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