发明名称 |
LOW ENVIRONMENTAL LOAD-TYPE PHOTOPOLYMERIZABLE COMPOUND |
摘要 |
PROBLEM TO BE SOLVED: To provide a monomer which can be subjected to alkaline development without using bisphenol A which may be an endocrine disrupter, and which satisfies properties required for dry film resists (DFR) such as sufficient curability and heat resistance. SOLUTION: The present invention provides a photopolymerizable compound represented by general formula I (wherein R<SB>1</SB>and R<SB>2</SB>are each H or CH<SB>3</SB>; m and n are each 2 or 3 or a mixture thereof; the form of addition for the mixture may be either random polymerization or block polymerization; and p and q are each a positive integer by which p+q satisfies 6-15). COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004217881(A) |
申请公布日期 |
2004.08.05 |
申请号 |
JP20030041880 |
申请日期 |
2003.01.16 |
申请人 |
TOHO CHEM IND CO LTD |
发明人 |
IRIUCHIJIMA SHINICHI;FUKAWA SHUHEI |
分类号 |
C08G65/332;C08F20/28;C08F299/02;(IPC1-7):C08F20/28 |
主分类号 |
C08G65/332 |
代理机构 |
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地址 |
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