| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer inspecting system capable of steadily suppressing stray light (optical noise) that is a cause of noise. SOLUTION: In this wafer inspecting system, the adjustment angle is controlled in an adjusting unit 30 or the position is determined of the edge section of an illumination reflecting element 102 so that the edge section of an illumination reflecting element 101, whereon the ineffective flux out of the illuminating flux not contributing to diffraction flux generation lands, is not in the regular reflection path L1 when light is projected on a semiconductor wafer 15 from the detector side. In another case, the adjustment angle is controlled in the adjusting unit 30 or the distance is determined between a housing inner wall EO and the semiconductor wafer 15 so that the housing inner wall EO, whereon the ineffective illuminating flux regularly reflected by the semiconductor wafer 15 lands, is not in the regular reflection path L1 when light is projected on the semiconductor wafer 15 from the detector side. COPYRIGHT: (C)2004,JPO&NCIPI
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