发明名称 CARBON THIN FILM AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To form an amorphous carbon film superior in electrical conductivity, corrosion resistance and adhesiveness. SOLUTION: A method for manufacturing a composite of an amorphous carbon film with a substrate having high conductivity comprises (1) immersing the substrate in methane gas plasma in a vacuum chamber, irradiating the substrate with positive ions in the plasma, and forming an ion-implanted layer on the surface layer of the substrate; (2) introducing hydrocarbon into the vacuum chamber, generating plasma, depositing hydrocarbon radicals on the substrate, applying a negative high-voltage pulse to the substrate, and acceleratingly irradiating the substrate with the positive ions; (3) at the same time, applying a high-voltage positive pulse (0.5 to 15 kV) to the substrate, and irradiating the substrate with electrons in the plasma to activate only the surface layer by the pulse and converts it into a high-temperature state; and (4) depositing the amorphous carbon film with high conductivity on the substrate by the steps of (1) to (3) described above. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004217975(A) 申请公布日期 2004.08.05
申请号 JP20030005283 申请日期 2003.01.14
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 MIYAGAWA SOUJI;MIYAGAWA YOSHIKO
分类号 C23C16/26;(IPC1-7):C23C16/26 主分类号 C23C16/26
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