| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure controller capable of preventing occurrence of release time lag without burdening a signal processing system and obtaining the optimum exposure. SOLUTION: The exposure controller has a photometric means 502 performing the photometry of field through an optical system including a lens and outputting the result of the photometry, an arithmetic means 504 arithmetically calculating an appropriate exposure value based on the result of the photometry, and a diaphragm control means 510 controlling a diaphragm value based on the arithmetically calculated appropriate exposure value. The controller is equipped with a posture detection means 500 detecting several kinds of device posture in photography, and has at least one driving control table for an actuator for driving a diaphragm of the control means 510, and optimally drives and controls the diaphragm by using the driving control table or based on the driving control table corresponding to the device posture detected by the detection means 500. COPYRIGHT: (C)2004,JPO&NCIPI |
