| 摘要 |
The present invention pertains to a method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on multi layer two-dimensional or three dimensional structure. The subject invention also relates to a maskless photolithography system and method for creating gray scale patterns and large scale patterns on substrates. The system and method uses a maskless pattern generator to generate a patterned light beam for exposing photoreactive materials. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce gray scale patterns to photoform layers of continuously variable thickness. In an alternate embodiment, the maskless pattern generator comprises a variably transmissive light filter, such as an LCD display, to variably filter light impinging on photoreactive materials to create gray scaled features. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. In a specific embodiment, a fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. In a embodiment, the fixture can be rotated in one, two, or three directions. |
