发明名称 |
Method for manufacturing a workpiece using a magnetron sputter source |
摘要 |
A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.
|
申请公布号 |
US2004149565(A1) |
申请公布日期 |
2004.08.05 |
申请号 |
US20030703217 |
申请日期 |
2003.11.06 |
申请人 |
UNAXIS BALZERS LIMITED |
发明人 |
HEINZ BERND;DUBS MARTIN;EISENHAMMER THOMAS;GRUNENFELDER PIUS;HAAG WALTER;KADLEC STANISLAV;KRASSNITZER SIEGFRIED |
分类号 |
C23C14/35;G11B7/26;H01J37/34;(IPC1-7):C23C14/35 |
主分类号 |
C23C14/35 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|