| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the increase of the number of manufacturing steps in a semi-permeable /semi-reflective liquid crystal display wherein a reflection layer is provided on the inner surface of a thin film transistor substrate. <P>SOLUTION: A gate electrode 7 and an auxiliary capacitance line 6 consisting of highly reflective metal such as an Al based metal are simultaneously formed at prescribed portions on the upper surface of the thin film transistor substrate 1. A pixel electrode 2 is formed on the auxiliary capacitance line 6 via a gate insulating film 9 and an interlayer insulating film 16. In this case, the auxiliary capacitance line 6 overlaps with nearly a half of the pixel electrode 2. In an aperture part 22a of a black mask 22, the part of the auxiliary capacitance line 6 overlapping with the pixel electrode 2 serves as a reflection layer to form a reflection part, and the part of the pixel electrode 2 which is not overlapped with the auxiliary capacitance line 6 constitutes a permeable part. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
