| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate having high sensitivity and secular stability and no such problems as film residue and a method of plate-making the lithographic printing plate free from the occurrence of residual layer on a non-exposed part even in the case of making highly sensitive by heating at 50-140°C after exposure. <P>SOLUTION: The photosensitive lithographic printing plate formed by laminating a photopolymerizable photosensitive layer and an oxygen cut-off layer on an aluminum supporting body. The photopolymerizable photosensitive layer contains a high molecular compound (A) having carbon-carbon double bond at least in the side chain, an acid value of 0.7-2.0 and ≤120°C glass transition temperature and soluble in a alkaline aqueous solution, a photopolymerization initiator (B) and an ethylenically unsaturated polymerizable compound (C). The photopolymerizable photosensitive layer is heated at 50-140°C after image exposure and after that, developed with the alkaline aqueous solution. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
