| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide the manufacturing method of a pattern form capable of reducing the cost required for masks at the time of discriminating the difference of the kind of a pattern form. <P>SOLUTION: In order to achieve the purpose, in the manufacturing method of a pattern form in which identification marks in which information of a pattern form consisting of a plurality of layers are contained are formed by using a layer which can be discriminated with viewing on the substrate among respective layers constituting the pattern form and the identification marks are formed by drawing energy to resist whose film is formed on a layer whose film is formed on the substrate and which can be discriminated with viewing, this invetion provides the manufacturing method of the pattern from which is characterized by discriminating the difference of the kind of the pattern form with the position of coordinates in which the identification marks are prepared. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
