发明名称 Method and apparatus to correct wafer drift
摘要 A method and apparatus is provided for determining workpiece drift from its nominal or intended position. The apparatus includes two proportionate sensors, each of which gives an output reading that depends upon how much of the sensor beam is blocked by an edge of the workpiece. A computer can calculate positional drift based upon these readings. Also disclosed is a method for aligning proportionate sensors to be parallel to one another.
申请公布号 US2004151574(A1) 申请公布日期 2004.08.05
申请号 US20010870393 申请日期 2001.05.29
申请人 LU ZHIMIN 发明人 LU ZHIMIN
分类号 H01L21/68;(IPC1-7):B65H1/00;B65G49/07 主分类号 H01L21/68
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