发明名称 BRITTLE MATERIAL SPUTTERING TARGET ASSEMBLY AND METHOD OF MAKING SAME
摘要 A method for producing a sputtering target assembly made from a material with a low coefficient of thermal expansion solder bonded to a backing plate with a coefficient of thermal expansion similar to that of the target assembly material. The method includes heat treating the target assembly material and backing plate, solder bonding the target assembly material and backing plate, and slowly cooling the assembly to room temperature. Matching the coefficients of thermal expansion of the target assembly material and backing plate minimizes distortion in the assembly caused from deflection and internal stress.
申请公布号 WO2004065046(A2) 申请公布日期 2004.08.05
申请号 WO2004US01441 申请日期 2004.01.21
申请人 TOSOH SMD, INC.;IVANOV, EUGENE, Y. 发明人 IVANOV, EUGENE, Y.
分类号 B23D;B23K1/00;B23K35/12;B23K35/14;C23C14/34;C23C26/00;C23C26/02 主分类号 B23D
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