| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for optimizing an illumination distribution of a pattern which should be formed on a substrate surface. <P>SOLUTION: The illumination is optimized by defining a transmission cross coefficient ("TCC") function determined correspondingly by a lighting pupil and a projection pupil according to a lighting device, by expressing at least one impulse function for resolvable features of at least one of masks which should be printed to a substrate, and by further making an interference map of a specified order based on at least one impulse function and the TCC function. The interference map represents at least one resolvable feature which should be printed to the substrate, and an interference region weakened each other. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
