OVERLAY INSPECTION METHOD OF EXPOSURE PROCESS

摘要

PROBLEM TO BE SOLVED: To minimize a shut down of an exposure process which is caused by a poor instrumentation by automatically exchanging to a second colored filter when the poor instrumentation occurs in the process of inspecting an overlay mark. SOLUTION: The overlay inspection method of the invention which uses a multiplex filter comprises the stage of: locating a first filter under the lens of an overlay inspection device by selecting the first filter among plural filters; determining whether the overlay mark can be recognized through the lens and the first filter or not; measuring the overlay mark when the overlay mark can be recognized; and exchanging the first filter with a second filter among the plural filters when the overlay mark can not be recognized through the first filter. COPYRIGHT: (C)2004,JPO&NCIPI