发明名称 Semiconductor laser element and method of fabrication thereof
摘要 A semiconductor laser element having an advantageous vertical light confinement efficiency, a low threshold current and a low element resistance is provided. The semiconductor laser element has a substrate and a stacked structure formed thereon, where the stacked structure comprises a buffer layer, an n-Al0.6Ga0.4As cladding layer, an n-Al0.47Ga0.53As cladding layer, an active layer, a p-Al0.47Ga0.53As first cladding layer, an Al0.55Ga0.45As etching stop layer, a p-Al0.47Ga0.53As second cladding layer, a p-Al0.6Ga0.4As third cladding layer, and a p-GaAs contact layer. The second and third cladding layers, and the contact layer are formed as a stripe-patterned ridge, and serve as a current injection regions. Both lateral portions of the ridge are filled with an n-type current blocking layer and serve as non-current-injection regions. Because the cladding layers on the active-layer-section side have a refractive index larger than that of the cladding layers disposed outward thereof, light leaked from the active layer section can efficiently be confined within the cladding layers on the active-layer-section side.
申请公布号 US2004151225(A1) 申请公布日期 2004.08.05
申请号 US20040762696 申请日期 2004.01.22
申请人 SONY CORPORATION 发明人 SATO YOSHIFUMI
分类号 H01S5/20;H01S5/00;H01S5/042;H01S5/22;H01S5/223;H01S5/32;H01S5/323;H01S5/343;(IPC1-7):H01S5/00 主分类号 H01S5/20
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