发明名称 Substrate holding device
摘要 Disclosed is a wafer chuck, which has protrusions for supporting a substrate, for attracting and holding the substrate by negative pressure while the substrate is being supported by the protrusions. The wafer chuck includes pin-shaped protrusions dispersed on a suction side of the chuck, and circular peripheral wall portions disposed in the vicinity of the rim of the supported substrate and in the vicinity of the outer peripheral portion of a lifting hole, respectively. The suction side of the wafer chuck is provided with a first area in which the pin-shaped protrusions are arrayed in a grid-line manner, and a second area in which the pin-shaped protrusions are arrayed in circumferential form. The second area is provided in the vicinity of the peripheral wall portion and peripheral wall portion, and the first area is provided elsewhere.
申请公布号 US2004150172(A1) 申请公布日期 2004.08.05
申请号 US20030682962 申请日期 2003.10.14
申请人 CANON KABUSHIKI KAISHA 发明人 MUTO YASUYO;TAKABAYASHI YUKIO
分类号 B23Q3/08;B25B11/00;G11B5/31;H01L21/027;H01L21/683;(IPC1-7):B23B31/30 主分类号 B23Q3/08
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