发明名称 |
COMPOSITION FOR FORMING SILICON.ALUMINUM FILM, SILICON.ALUMINUM FILM AND METHOD FOR FORMING THE SAME |
摘要 |
<p>A composition for forming a silicon.aluminum film, characterized in that it comprises a silicon compound and an aluminum compound; and a method for forming a silicon.aluminum film, which comprises forming a coating film of the above composition and then subjecting the coating film to a thermal treatment and/or an optical treatment. The composition and the method allow the formation of a silicon.aluminum film with ease and simplicity at a reduced production cost without the need for an expensive vacuum apparatus or high frequency apparatus.</p> |
申请公布号 |
WO2004065659(A1) |
申请公布日期 |
2004.08.05 |
申请号 |
WO2003JP16579 |
申请日期 |
2003.12.24 |
申请人 |
JSR CORPORATION;YOKOYAMA, YASUAKI;MATSUKI, YASUO |
发明人 |
YOKOYAMA, YASUAKI;MATSUKI, YASUO |
分类号 |
C03C17/36;C03C17/10;C23C18/08;C23C18/12;C23C18/14;H01B5/14;H01B13/00;H01L31/04;(IPC1-7):C23C18/08 |
主分类号 |
C03C17/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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