| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an image forming method which attains a high speed exposure, is excellent in image forming performance, improved in temperature dependency in the exposure, and is useful particularly for plate-making a planographic printing plate excellent in productivity and plate wear. <P>SOLUTION: The image forming method has an exposure process for imagewisely exposing an image forming material having a photosensitive layer which contains an infrared adsorbent, a polymerization initiator and a polymerizable compound and decreases the solubility to an alkali developer by 750-1,400 nm wave length exposure on a supporting body while overlapping infrared ray and an image forming process for developing the image forming material. The imagewise exposure is carried out under a condition that the beam diameter of infrared light beam used for the exposure process is ≤20 μm and the overlapping factor which is a ratio of the half value width (FWHM) of the beam intensity in the infrared light beam diameter to the pitch of the beam in the vertical scanning side is ≥1. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
