METHOD AND SYSTEM FOR DYNAMIC MODELING AND RECIPE OPTIMIZATION OF SEMICONDUCTOR ETCH PROCESSES

摘要

A method and system are disclosed for creating dynamic models (7:760) of etch processes in semiconductor manufacturing. In one embodiment, a method comprises modeling an etch process used in semiconductor manufacturing to generate a dynamic process model. The dynamic process model is used to determine input values (7:720) that result in a desired output value. A process recipe (7:765) is optimized for the etch process with the input values.