| 摘要 |
The invention concerns a method for treating a structure, which consists in: providing an initial structure comprising at least one main part (13) and a secondary part (21) which have a contact interface with each other and means constituting at least one zone to be treated capable of varying in thickness substantially perpendicularly to said interface under the effect of a treatment of the material of which it is made; and applying said treatment to said zone of the initial structure to be treated so as to obtain a final structure (12) such that the variation in the thickness of said zone creates the formation of an internal space (25) extending between said parts over at least one zone of said interface and substantially parallel to said interface or within at least one of said parts, spaced apart and substantially parallel to said interface. The invention also concerns the structure (12) with internal space (25) resulting from the displacement of one part relative to another part of said structure. |
